Intel 4 Process Node In Detail: 2x Density Scaling, 20% Improved Performance

Stefan Mileschin · 14th June 2022, 08:21

Taking place this week is the IEEE’s annual VLSI Symposium, one of the industry’s major events for disclosing and discussing new chip manufacturing techniques. One of the most anticipated presentations scheduled this year is from Intel, who is at the show to outline the physical and performance characteristics of their upcoming Intel 4 process, which will be used for products set to be released in 2023. The development of the Intel 4 process represents a critical milestone for Intel, as it’s the first Intel process to incorporate EUV, and it’s the first process to move past their troubled 10nm node – making it Intel’s first chance to get back on track to re-attaining fab supremacy.

https://www.anandtech.com/show/17448...ed-performance

14th June 2022, 08:21	#1
Stefan Mileschin [M] Reviewer Join Date: May 2010 Location: Romania Posts: 148,812	Intel 4 Process Node In Detail: 2x Density Scaling, 20% Improved Performance Taking place this week is the IEEE’s annual VLSI Symposium, one of the industry’s major events for disclosing and discussing new chip manufacturing techniques. One of the most anticipated presentations scheduled this year is from Intel, who is at the show to outline the physical and performance characteristics of their upcoming Intel 4 process, which will be used for products set to be released in 2023. The development of the Intel 4 process represents a critical milestone for Intel, as it’s the first Intel process to incorporate EUV, and it’s the first process to move past their troubled 10nm node – making it Intel’s first chance to get back on track to re-attaining fab supremacy. https://www.anandtech.com/show/17448...ed-performance

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