AMD and IBM Detail 45nm Process Using Immersion Lithography

Intel has said on multiple occasions that its 45nm process is on track for production 2007. In fact, Intel began sampling its “Penryn” 45nm chips just several weeks ago. At the IEDM, IBM and AMD described three technologies that hope to compete with Intel’s 45nm development: the use of immersion lithography, which AMD says will “deliver enhanced microprocessor design definition and manufacturing consistency,” ultra-low-K interconnect dielectrics to enhance performance-per-watt ratio and multiple enhanced transistor strain techniques.